标准编号:	GB/T 46611-2025
中文名称:	电光调制器用铌酸锂单晶薄膜
英文名称:	Lithium niobate single-crystal thin film for electro-optic modulator
行业分类:	GB    国家标准
发布机构:	国家市场监督管理总局 国家标准化管理委员会
发布日期:	2025-10-31
实施日期:	2026-5-1
标准状态:	to be valid
翻译语言:	英文
文件格式:	PDF
中文字符数:	29000 字
翻译价格(元):	2030.0
交付时间:	付款后 1~5 个工作日

GB/T 46611-2025 Lithium niobate single-crystal thin film for electro-optic modulator English, Anglais, Englisch, Inglés, えいご This is a draft translation for reference among interesting stakeholders. The finalized translation (passing through draft translation, self-check, revision and verification) will be delivered upon being ordered. ICS 13.220.10 CCS H 57 National Standard of the People's Republic of China ‌GB/T 46609-2025 Lithium niobate single-crystal thin film for electro-optic modulator 电光调制器用铌酸锂单晶薄膜 Issue date: 2025-10-31 Implementation date: 2026-05-01 Issued by the General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China the Standardization Administration of the People's Republic of China Contents Foreword 1 Scope 2 Normative References 3 Terms and Definitions 4 Requirements 4.1 Appearance Quality 4.2 Tolerance of Surface Orientation 4.3 Tolerance of Bonding Deflection Angle 4.4 Bonding Strength 4.5 Optical Homogeneity 4.6 Linear Electro-Optic Coefficient 4.7 Single-Domain Degree 4.8 Substrate Resistivity 5 Test Methods 5.1 Test Environment 5.2 Total Thickness 5.3 Total Thickness Variation 5.4 Local Thickness Variation and Percent Local Thickness Variation 5.5 Edge Area Width 5.6 Surface Appearance Quality 5.7 17-Point Average Thickness Tolerance and 17-Point Thickness Variation 5.8 Bow 5.9 Front Surface Roughness 5.10 Tolerance of Surface Orientation 5.11 Tolerance of Bonding Deflection Angle 5.12 Bonding Strength 5.13 Optical Homogeneity 5.14 Linear Electro-Optic Coefficient 5.15 Single-Domain Degree 5.16 Substrate Resistivity 6 Inspection and Acceptance Rules 6.1 Inspection and Acceptance 6.2 Inspection Categories 6.3 Inspection Items 6.4 Lot Inspection 6.5 Periodic Inspection 7 Packaging, Labeling/Marking, Storage and Transport 7.1 Packaging 7.2 Labeling/Marking 7.3 Storage 7.4 Transport Appendix A (Normative) Method for Measuring Bonding Deflection Angle Appendix B (Normative) Method for Measuring Optical Homogeneity Appendix C (Normative) Method for Measuring Linear Electro-Optic Coefficient Appendix D (Normative) Method for Measuring Single-Domain Degree 1 Scope This document specifies the requirements, inspection and testing rules, packaging, labeling/marking, storage, and transportation requirements for lithium niobate single-crystal thin films used in electro-optic modulators. It also describes the test methods. This document applies to congruently-melt lithium niobate single-crystal thin films for electro-optic modulators with X-cut orientation, a lithium niobate thin film layer thickness ranging from 100 nm to 1,000 nm, and diameters of 76.2 mm, 100.0 mm, 150.0 mm, and 200.0 mm. Lithium niobate single-crystal thin films of other specifications may refer to this document for implementation. 2 Normative References The following documents contain provisions that, through normative reference in this text, constitute essential provisions of this document. For dated references, only the edition corresponding to that date applies. For undated references, the latest edition of the referenced document (including any amendments) applies. GB/T 191-2008 Packaging—Pictorial marking for handling of goods GB/T 1185 Surface imperfections of optical parts GB/T 1551 Test method for resistivity of silicon single crystal—Two-probe and four-probe D. C. methods on straight specimens GB/T 2828.1-2012 Sampling procedures for inspection by attributes—Part 1: Sampling schemes indexed by acceptance quality limit (AQL) for lot-by-lot inspection GB/T 6618 Test method for thickness and total thickness variation of silicon slices GB/T 6619 Test method for bow of silicon slices GB/T 14264 Terminology of semiconductor materials GB/T 20919 Digital external micrometer GB/T 25915.1-2021 Cleanrooms and associated controlled environments—Part 1: Classification of air cleanliness by particle concentration GB/T 29505 Test method for measuring surface roughness on planar surfaces of silicon wafers GB/T 30118 Specification and measuring method of single crystal wafer for surface acoustic wave (SAW) devices GB/T 30857 Test method for thickness and thickness variation of sapphire substrates GB/T 40279 Test method for thin film thickness on silicon wafer surfaces—Optical reflectance method GB/T 41853 Semiconductor devices—Micro-electromechanical devices—Measurement of bonding strength between wafers 3 Terms and Definitions For the purposes of this document, the terms and definitions given in GB/T 14264, GB/T 6619, GB/T 30118, and the following apply. 3.1 lithium niobate single-crystal thin film; TFLN A thin film compound of single-crystal lithium niobate with the chemical formula LiNbO₃, prepared on a specific substrate, with a thickness ranging from 100 nm to 1,000 nm. Note: TFLN typically comprises a sequentially stacked structure of a lithium niobate single-crystal thin film layer, an insulating layer, a trap layer, and a substrate. The trap layer may be omitted as required. Its structure is shown in Figure 1. 3.3 average thickness tolerance of 17 positions; TT17 The allowable tolerance for the average thickness of each film layer measured at 17 specified positions. 3.4 thickness variation of 17 positions; TV17 The degree of variation in the thickness of each film layer measured at 17 specified positions, defined as the difference between the maximum and minimum values among the 17 thickness measurements. 3.5 total thickness variation; TTV The deviation between the maximum and minimum thickness of the TFLN. 3.6 local thickness variation; LTV The thickness variation within a matrix formed by selected areas of specific side lengths on the TFLN. 3.7 percent local thickness variation; PLTV The percentage of the selected areas that satisfy the specified LTV value. 3.8 edge area The region at the edge of the TFLN where the lithium niobate single-crystal thin film layer is absent. Note: Its dimension is defined as the distance between the edge of the lithium niobate single-crystal thin film layer and the edge of the substrate, referred to as the edge area width. 3.9 fixed quality area; FQA The inner region of the TFLN determined by a distance of 5 mm from the edge of the TFLN substrate, as shown in Figure 2. 3.10 tolerance of surface orientation The allowable tolerance between the specified surface orientation of the lithium niobate single-crystal thin film layer and the measured orientation obtained through X-ray diffraction. 3.11 tolerance of bonding deflection angle The allowable tolerance for the angle between the orientation flat of the lithium niobate single-crystal thin film layer and the orientation flat of the substrate in the TFLN. 3.12 void A region within the TFLN where the lithium niobate single-crystal thin film layer or the insulating layer is missing. 3.13 colour spot A region on the surface of the lithium niobate single-crystal thin film layer exhibiting color variation. 4 Requirements 4.1 Appearance and Quality 4.1.1 Dimensions of TFLN The dimensional and tolerance technical requirements for TFLN shall comply with the provisions of Table 1. Table 1 Technical Requirements for Dimensions and Tolerances of TFLN 4.2 Tolerance of Surface Orientation Shall be not greater than 0.3°. 4.3 Tolerance of Bonding Deflection Angle Shall be not greater than 1°.